Mechanical components intended to run in clean rooms for wafer fabrication must comply with uniform industry standards that dictate the number and size of particles they can generate.
As the computer and electronics industries pack more circuits on semiconductor wafers, particle generation in the clean rooms where they are processed becomes more critical with each generation. In many applications, mechanical positioning stages are a large contributor to contamination. Suppliers are required to follow special design criteria that ensure a positioning stage’s cleanliness according to certain standards…
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